Lithographically directed materials assembly

Richard P. Kingsborough; Russell B. Goodman; Keith Krohn; Theodore H. Fedynyshyn

doi:10.1117/12.814625

17 March 2009 Lithographically directed materials assembly

Richard P. Kingsborough, Russell B. Goodman, Keith Krohn, Theodore H. Fedynyshyn

Proceedings Volume 7271, Alternative Lithographic Technologies; 72712D (2009) https://doi.org/10.1117/12.814625
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We have developed a processing method that significantly reduces the number of steps necessary to yield a surface that directs block copolymer assembly. This methodology employs a single resistless lithography step that directly changes the surface energy without requiring subsequent material deposition or plasma etching steps. The lithographically defined difference in surface energies acts as a template to direct diblock polymer self-assembly into low-defect periodic structures. Our newly developed lithographically directed self-assembly technique can produce sub-45 nm half pitch lines employing poly(styrene-b-methyl methacrylate) (PS-b-PMMA) and interference lithography. Once assembled into periodic lines of alternating materials, the PMMA block can be removed and the resulting polystyrene features can be used as an etch mask to transfer periodic lines-and-spaces into a silicon substrate.

Citation Download Citation

Richard P. Kingsborough, Russell B. Goodman, Keith Krohn, and Theodore H. Fedynyshyn "Lithographically directed materials assembly", Proc. SPIE 7271, Alternative Lithographic Technologies, 72712D (17 March 2009); https://doi.org/10.1117/12.814625

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