Atomic processes in the LPP and LA-DPP EUV sources

Akira Sasaki; Katsunobu Nishihara; Atsushi Sunahara; Hiroyuki Furukawa; Takeshi Nishikawa; Fumihiro Koike

doi:10.1117/12.814026

18 March 2009 Atomic processes in the LPP and LA-DPP EUV sources

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, Fumihiro Koike

Proceedings Volume 7271, Alternative Lithographic Technologies; 727130 (2009) https://doi.org/10.1117/12.814026
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently. We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

Citation Download Citation

Akira Sasaki, Katsunobu Nishihara, Atsushi Sunahara, Hiroyuki Furukawa, Takeshi Nishikawa, and Fumihiro Koike "Atomic processes in the LPP and LA-DPP EUV sources", Proc. SPIE 7271, Alternative Lithographic Technologies, 727130 (18 March 2009); https://doi.org/10.1117/12.814026

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