Paper
18 March 2009 Flare compensation for EUVL
Author Affiliations +
Abstract
At Selete, correction for flare based on a flare point-spread function (PSFF) is investigated. We divide a layout into a grid and calculate pattern density for each grid square, obtaining a density array as an approximation to the layout aerial image. Then, the density array is convolved with the PSFF to create an array of flare values. Using this flare-value array, we resize the layout. In the above correction flow, size of a grid square of density array and a selection of an approximate function of the PSFF have a great influence on the accuracy of flare value computation. In this study, correction for flare was applied to the fabrication of several test masks using the real PSFF obtained from a full-field step-and-scan exposure tool called EUV1. We report on the optimization of size of grid square, on a suitable approximation model of PSFF, and on feedbacks from exposure experiments.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yukiyasu Arisawa, Hajime Aoyama, Taiga Uno, Toshihiko Tanaka, and Ichiro Mori "Flare compensation for EUVL", Proc. SPIE 7271, Alternative Lithographic Technologies, 727145 (18 March 2009); https://doi.org/10.1117/12.814187
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Point spread functions

Extreme ultraviolet lithography

Electronic design automation

Tolerancing

Optimization (mathematics)

Convolution

Fractal analysis

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