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23 March 2009 MOSAIC: a new wavefront metrology
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Abstract
MOSAIC is a new wavefront metrology that enables complete wavefront characterization from print or aerial image based measurements. Here we describe MOSAIC and verify its utility with a model-based proof of principle.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher N. Anderson and Patrick P. Naulleau "MOSAIC: a new wavefront metrology", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72720B (23 March 2009); https://doi.org/10.1117/12.814303
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