New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Akitoshi Kawai; Fuminori Hayano; Kazumasa Endo; Kiminori Yoshino; Yuichiro Yamazaki

doi:10.1117/12.814046

23 March 2009 New inspection technology for hole pattern by Fourier space on hp 4x-nm generation

Akitoshi Kawai, Fuminori Hayano, Kazumasa Endo, Kiminori Yoshino, Yuichiro Yamazaki

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 727219 (2009) https://doi.org/10.1117/12.814046
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We tried to detect the CD variation of the 4x generation hole pattern using the diffraction light on Fourier space with the polarized light and the modified illumination. The new technology named DD (Dual Diffraction) method has been developed based on the optical simulation and the experimental approaches. We introduce the case of detection for the diameter variation on a multi-layered hole pattern with new method.

Citation Download Citation

Akitoshi Kawai, Fuminori Hayano, Kazumasa Endo, Kiminori Yoshino, and Yuichiro Yamazaki "New inspection technology for hole pattern by Fourier space on hp 4x-nm generation", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727219 (23 March 2009); https://doi.org/10.1117/12.814046

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