Translator Disclaimer
Paper
23 March 2009 Analysis of systematic errors in lateral shearing interferometry for EUV optical testing
Author Affiliations +
Abstract
Lateral shearing interferometry (LSI) provides a simple means for characterizing the aberrations in optical systems at EUV wavelengths. In LSI, the test wavefront is incident on a low-frequency grating which causes the resulting diffracted orders to interfere on the CCD. Due to its simple experimental setup and high photon efficiency, LSI is an attractive alternative to point diffraction interferometry and other methods that require spatially filtering the wavefront through small pinholes which notoriously suffer from low contrast fringes and improper alignment. In order to demonstrate that LSI can be accurate and robust enough to meet industry standards, analytic models are presented to study the effects of unwanted grating and detector tilt on the system aberrations, and a method for identifying and correcting for these errors in alignment is proposed. The models are subsequently verified by numerical simulation. Finally, an analysis is performed of how errors in the identification and correction of grating and detector misalignment propagate to errors in fringe analysis.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryan Miyakawa, Patrick Naulleau, and Ken Goldberg "Analysis of systematic errors in lateral shearing interferometry for EUV optical testing", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72721V (23 March 2009); https://doi.org/10.1117/12.812340
PROCEEDINGS
6 PAGES


SHARE
Advertisement
Advertisement
Back to Top