Overlay mark optimization using the KTD signal simulation system

Anat Marchelli; Karsten Gutjahr; Michael Kubis; Christian Sparka; Mark Ghinovker; Alessandra Navarra; Amir Widmann

doi:10.1117/12.813594

23 March 2009 Overlay mark optimization using the KTD signal simulation system

Anat Marchelli, Karsten Gutjahr, Michael Kubis, Christian Sparka, Mark Ghinovker, Alessandra Navarra, Amir Widmann

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72722Y (2009) https://doi.org/10.1117/12.813594
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

As the overlay performance and accuracy requirements become tighter, the impact of process parameters on the target signal becomes more significant. Traditionally, in order to choose the optimum overlay target, several candidates are placed in the kerf area. The candidate targets are tested under different process conditions, before the target to be used in mass production is selected. The varieties of targets are left on the mass production mask and although they will not be used for overlay measurements they still consume kerf real estate. To improve the efficiency of the process we are proposing the KTD (KLA-Tencor Target Designer). It is an easy to use system that enables the user to select the optimum target based on advanced signal simulation. Implementing the KTD in production is expected to save 30% of kerf real estate due to more efficient target design process as well as reduced engineering time. In this work we demonstrate the capability of the KTD to simulate the Archer signal in the context of advanced DRAM processes. For several stacks we are comparing simulated target signals with the Archer100 signals. We demonstrate the robustness feature in the KTD application that enables the user to test the target sensitivity to process changes. The results indicate the benefit of using KTD in the target optimization process.

Citation Download Citation

Anat Marchelli, Karsten Gutjahr, Michael Kubis, Christian Sparka, Mark Ghinovker, Alessandra Navarra, and Amir Widmann "Overlay mark optimization using the KTD signal simulation system", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72722Y (23 March 2009); https://doi.org/10.1117/12.813594

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