Paper
23 March 2009 Improve scanner matching using automated real-time feedback control via scanner match maker (SMM)
Shian-Huan (Cooper) Chiu, Sheng-Hsiung Yu, Min-Hin Tung, Lei-Ken Wu, Ya-Tsz Yeh, James Manka, Chao-Tien (Healthy) Huang, John Robinson, Chin-Chou (Kevin) Huang, David Tien, YuYu Chen, Katsushi Makino, Jium-Ming Lin
Author Affiliations +
Abstract
Traditional "matching matrix" methods for characterizing scanner matching assume that the scanner distortion performance is static. The latest scanner models can adjust the distortion performance dynamically, at run-time. The Scanner Match Maker (SMM) system facilitates calculation and application of these run-time adjustments, improving effective overlay performance of the scanner fleet, allowing more flexibility for mix-and-match exposure. The overlay |mean|+3s performance was improved significantly for a layer pair that is currently allowed mix-and-match pairing.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shian-Huan (Cooper) Chiu, Sheng-Hsiung Yu, Min-Hin Tung, Lei-Ken Wu, Ya-Tsz Yeh, James Manka, Chao-Tien (Healthy) Huang, John Robinson, Chin-Chou (Kevin) Huang, David Tien, YuYu Chen, Katsushi Makino, and Jium-Ming Lin "Improve scanner matching using automated real-time feedback control via scanner match maker (SMM)", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723E (23 March 2009); https://doi.org/10.1117/12.814186
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KEYWORDS
Scanners

Distortion

Semiconducting wafers

Overlay metrology

Phase modulation

Feedback control

Optical lithography

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