Study of residue type defect formation mechanism and the effect of advanced defect reduction (ADR) rinse process

Hiroshi Arima; Yuichi Yoshida; Kosuke Yoshihara; Tsuyoshi Shibata; Yuki Kushida; Hiroki Nakagawa; Yukio Nishimura; Yoshikazu Yamaguchi

doi:10.1117/12.814034

1 April 2009 Study of residue type defect formation mechanism and the effect of advanced defect reduction (ADR) rinse process

Hiroshi Arima, Yuichi Yoshida, Kosuke Yoshihara, Tsuyoshi Shibata, Yuki Kushida, Hiroki Nakagawa, Yukio Nishimura, Yoshikazu Yamaguchi

Author Affiliations +

Proceedings Volume 7273, Advances in Resist Materials and Processing Technology XXVI; 727333 (2009) https://doi.org/10.1117/12.814034
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Residue type defect is one of yield detractors in lithography process. It is known that occurrence of the residue type defect is dependent on resist development process and the defect is reduced by optimized rinsing condition. However, the defect formation is affected by resist materials and substrate conditions. Therefore, it is necessary to optimize the development process condition by each mask level. Those optimization steps require a large amount of time and effort. The formation mechanism is investigated from viewpoint of both material and process. The defect formation is affected by resist material types, substrate condition and development process condition (D.I.W. rinse step). Optimized resist formulation and new rinse technology significantly reduce the residue type defect.

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Hiroshi Arima, Yuichi Yoshida, Kosuke Yoshihara, Tsuyoshi Shibata, Yuki Kushida, Hiroki Nakagawa, Yukio Nishimura, and Yoshikazu Yamaguchi "Study of residue type defect formation mechanism and the effect of advanced defect reduction (ADR) rinse process", Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727333 (1 April 2009); https://doi.org/10.1117/12.814034

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