You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
16 March 2009Innovative pattern matching method considering process margin and scanner design information
Methods to improve accuracy of pattern matching are investigated with our software tool (k1 TUNE). Since pattern
matching handles experimental data, resist simulation accuracy, SEM measurement accuracy, and identification of
illumination situations used in the software and set in actual scanners are crucial. The methods to reduce their error are
proposed. In addition to reducing them, a subtracting method is used to compensate them for better pattern matching.
The effectiveness is certificated experimentally with accuracy of 0.010 sigma of illumination and 1~2nm of CD.
Furthermore an illumination that keeps CDs constant under defocus is optimized, and the characteristics are confirmed
experimentally.
By using the software tool under the proposed ways, real pattern matching at fabrication lines has been possible with
good accuracy, few retry, and consideration of defocus characteristics.