Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction

Jue-Chin Yu; Peichen Yu; Hsueh-Yung Chao

doi:10.1117/12.814413

16 March 2009 Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Author Affiliations +

Proceedings Volume 7274, Optical Microlithography XXII; 72743B (2009) https://doi.org/10.1117/12.814413
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We propose an inversion calculation method based on a simple "pixel-flipping" approach. The simple method features innovative wavefront-expansion and wavefront-based damping techniques in order to obtain accentuated corrections near the drawn pattern. The method is first employed to be a stand-alone optical proximity correction solution that directly calculates the corrected masks with acceptable contours and image contrast. In addition, a model-based pre-OPC flow, where the initial sizing of drawn patterns and surrounding sub-resolution assist features (SRAF) are simultaneously generated in a single iteration using this inversion calculation is also proposed to minimize technology-transition risks and costs. A mask simplification technique based on the central moments is introduced in order to snap the corrections into 45 degree and axis-aligned line segments. This approach allows achieving optimized corrections while minimizing the impact to the existing and validated correction flow.

Citation Download Citation

Jue-Chin Yu, Peichen Yu, and Hsueh-Yung Chao "Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction", Proc. SPIE 7274, Optical Microlithography XXII, 72743B (16 March 2009); https://doi.org/10.1117/12.814413

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