The nebulous hotspot and algorithm variability

Alfred K. K. Wong; Edmund Y. Lam

doi:10.1117/12.816449

12 March 2009 The nebulous hotspot and algorithm variability

Alfred K. K. Wong, Edmund Y. Lam

Author Affiliations +

Proceedings Volume 7275, Design for Manufacturability through Design-Process Integration III; 727509 (2009) https://doi.org/10.1117/12.816449
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Computation lithography relies on algorithms. These algorithms exhibit variability that can be as much as 5% (1 σ) of the critical dimension for the 65-nm technology. Using hotspot analysis and fixing as an example, such variability can be addressed on the algorithm level via controlling and eliminating its root causes, and on the application level by setting specifications that are commensurate with both the limitations of the algorithms and the goals of the application.

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Alfred K. K. Wong and Edmund Y. Lam "The nebulous hotspot and algorithm variability", Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 727509 (12 March 2009); https://doi.org/10.1117/12.816449

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