Verification of extraction repeating pattern efficiency from many actual device data

Masahiro Shoji; Tadao Inoue; Masaki Yamabe

doi:10.1117/12.811965

12 March 2009 Verification of extraction repeating pattern efficiency from many actual device data

Masahiro Shoji, Tadao Inoue, Masaki Yamabe

Proceedings Volume 7275, Design for Manufacturability through Design-Process Integration III; 72750Q (2009) https://doi.org/10.1117/12.811965
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

In May 2006, the Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) at the Association of Super-Advanced Electronics Technologies (ASET) launched 4-year program for reducing mask manufacturing cost and TAT by concurrent optimization of MDP, mask writing, and mask inspection [1]. One area of the project focuses on the extraction and utilization of repeating patterns. The repeating patterns are extracted from the mask data after OPC. The information is then used in Character Projection (CP) for reducing the shot counts during the electron beam writing. In this paper we will address the verification of the efficiency in extracting repeating pattern from the actual device production data obtained from the member companies of MaskD2I, and will report on the improvement of the software tool by these results.

Citation Download Citation

Masahiro Shoji, Tadao Inoue, and Masaki Yamabe "Verification of extraction repeating pattern efficiency from many actual device data", Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750Q (12 March 2009); https://doi.org/10.1117/12.811965

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