Optimizing attaching area in an ultrathin active mirror system

Bin Xie; Ying Ni

doi:10.1117/12.831437

5 May 2009 Optimizing attaching area in an ultrathin active mirror system

Bin Xie, Ying Ni

Proceedings Volume 7281, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes; 72810D (2009) https://doi.org/10.1117/12.831437
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China

Abstract

Ultra-thin mirror often is used in active optics and adaptive optics. To maintain its surface, activators are used. Many factors are important including how much area should the attaching area be. A simplified deformation model was established considering mirrors' practical using. It would deform linearly outside attaching area and keep no change within attaching area. In this model, aspherical error is a key factor. Using zernike polynomials, the relationship between attaching area and surface error introduce by activator is established. At last, finite element method is used to testify theoretical analysis. It proves to be reasonable that decrease the ratio of attaching area and activator's controlling area. To decrease stiff concentration, the ratio should be about 1/10.

Citation Download Citation

Bin Xie and Ying Ni "Optimizing attaching area in an ultrathin active mirror system", Proc. SPIE 7281, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 72810D (5 May 2009); https://doi.org/10.1117/12.831437

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