The theoretical analysis of tri-beam SPPs interference through Ag film

Fengze Jin; Jinglei Du; Yongkang Guo; Lifang Shi; Chunlei Du

doi:10.1117/12.832081

18 May 2009 The theoretical analysis of tri-beam SPPs interference through Ag film

Fengze Jin, Jinglei Du, Yongkang Guo, Lifang Shi, Chunlei Du

Proceedings Volume 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; 72840M (2009) https://doi.org/10.1117/12.832081
Event: AOMATT 2008 - 4th International Symposium on Advanced Optical Manufacturing, 2008, Chengdu, Chengdu, China

Abstract

Through combination of multi-beam coherent SPPs which are excited by p-polarized wide light which illuminates the interface between prism and metal with resonance angle for interference exposure with, and optimizes exposal parameter of interference lithography, we can obtain high differentiate and high contrast of periodicity nanometer structure by using SPPs of shortwave and near field with enhanced. In this paper,we set up interferential model of SPPs using equation groups of Maxwell below Kretschmann structure, and simulate SPPs interferns and receive nanometer lattice and discuss the influence of refractive index of prism and resist .The method is suitable for fabricating nanometer photonic crystal and deep sub-micrometer periodic patterns in large field size used in opto-eletronical components and it can effectively debase got-up cost.

Citation Download Citation

Fengze Jin, Jinglei Du, Yongkang Guo, Lifang Shi, and Chunlei Du "The theoretical analysis of tri-beam SPPs interference through Ag film", Proc. SPIE 7284, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 72840M (18 May 2009); https://doi.org/10.1117/12.832081

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KEYWORDS

Lithography

Metals

Prisms

Refractive index

Silver

Photomasks

Nanolithography

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