Translator Disclaimer
Paper
11 May 2009 Site-specific dual ink dip pen nanolithography
Author Affiliations +
Abstract
The ability to deposit two different materials with nanoscale precision at user specified locations is a very important attribute of dip pen nanolithography (DPN). However, the potential of DPN goes beyond simple deposition since DPN used in conjunction with lateral force microscopy (LFM) allows site-specific investigations of nanoscale properties. In this work, we use two different inks, 16-Mercaptohexadecanoic acid (MHA) and 1-octadenethiol (ODT) to show sitespecific dual ink DPN enabled exclusively by our proprietary software. A diamond-dot pattern was created by using a layer-to-layer alignment (LLA) algorithm which enables the MHA (diamond) to be written concentric with the ODT (central dot) pattern. This simple demonstration of multi-ink DPN is not specific to alkanethiol ink systems, but is also applicable to other multi-material patterning, interaction and exchange studies.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Omkar A. Nafday, Jason R. Haaheim, Fredy Villagran, and Tom Levesque "Site-specific dual ink dip pen nanolithography", Proc. SPIE 7318, Micro- and Nanotechnology Sensors, Systems, and Applications, 73180A (11 May 2009); https://doi.org/10.1117/12.818918
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top