Measuring small thickness changes of a thin film by white-light spectral interferometry

P. Hlubina; J. Lunácek; D. Ciprian; M. Lunácková

doi:10.1117/12.820005

18 May 2009 Measuring small thickness changes of a thin film by white-light spectral interferometry

P. Hlubina, J. Lunácek, D. Ciprian, M. Lunácková

Proceedings Volume 7356, Optical Sensors 2009; 735618 (2009) https://doi.org/10.1117/12.820005
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

A white-light spectral interferometric technique is used for measuring small thickness changes of a SiO₂ thin film grown by thermal oxidation on a Si substrate. The technique is based on recording of the spectral interferograms in a Michelson interferometer with one of its mirrors replaced by a thin-film structure. From the spectral interferograms, the nonlinear-like phase function related to the phase change on reflection from the thin-film structure is retrieved. The phase function is fitted to the theoretical one to obtain the thin-film thickness precisely provided that the optical constants of the thin-film structure are known. This procedure is used for measuring small thickness changes of a SiO₂ thin film attributed to different dopant concentrations of a Si substrate. The results of the technique are compared with those obtained by spectral reflectometry and very good agreement is confirmed.

Citation Download Citation

P. Hlubina, J. Lunácek, D. Ciprian, and M. Lunácková "Measuring small thickness changes of a thin film by white-light spectral interferometry", Proc. SPIE 7356, Optical Sensors 2009, 735618 (18 May 2009); https://doi.org/10.1117/12.820005

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