Improved model of the photo-initiation mechanisms in photopolymer materials

Shui Liu; Michael R. Gleeson; Dusan Sabol; John T. Sheridan

doi:10.1117/12.820996

19 May 2009 Improved model of the photo-initiation mechanisms in photopolymer materials

Shui Liu, Michael R. Gleeson, Dusan Sabol, John T. Sheridan

Proceedings Volume 7358, Holography: Advances and Modern Trends; 73580Q (2009) https://doi.org/10.1117/12.820996
Event: SPIE Optics + Optoelectronics, 2009, Prague, Czech Republic

Abstract

In order to further improve photopolymer materials for applications such as data storage, a deeper understanding of the photochemical mechanisms which are present during the formation of holographic gratings has become ever more crucial. This is especially true of the photoinitiation processes, since holographic data storage requires multiple sequential short exposures. Previously, models describing for the temporal variation of the photosensitizer concentration as a function of exposure have been presented and applied to two different types of photosensitizer, which includes the effects of photosensitizer recovery and bleaching under certain conditions. In this paper, based on a detailed study of the photochemical reactions, the previous model is improved to more closely represent these physical effects in a more general fashion, enabling a more accurate description of the time varying absorption and thus of the generation of primary radicals.

Citation Download Citation

Shui Liu, Michael R. Gleeson, Dusan Sabol, and John T. Sheridan "Improved model of the photo-initiation mechanisms in photopolymer materials", Proc. SPIE 7358, Holography: Advances and Modern Trends, 73580Q (19 May 2009); https://doi.org/10.1117/12.820996

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