FZ growth of Ti3+:Al2O3 and its properties

Shigeyuki Kimura; Yuzaburo Segawa; Nobuhiro Kodama; Kenji Kitamura; Kosuke Kosuda; Masayuki Tsutsumi

doi:10.1117/12.938062

6 April 1987 FZ growth of Ti3+:Al2O3 and its properties

Shigeyuki Kimura, Yuzaburo Segawa, Nobuhiro Kodama, Kenji Kitamura, Kosuke Kosuda, Masayuki Tsutsumi

Proceedings Volume 0736, New Slab and Solid-State Laser Technologies and Applications; (1987) https://doi.org/10.1117/12.938062
Event: OE LASE'87 and EO Imaging Symposium, 1987, Los Angeles, CA, United States

Abstract

Floating zone technique using an arc image furnace was applied for growing Ti3+ :Al203 single crystals with high doping levels. Up to 1 atom % of Ti was incorporated with relatively uniform concentration distribution. The disturbing optical absorption around 800 nm was found to increase parabolically with Ti concentration and its possible origin was suggested in relation to clustering in the crystal. Detection of no appreciable inclusions in the crystal eliminated the possibility of the scattering loss. The concentration quenching of the fluorescence lifetime was found to take place beyond 0.3 atom %.

Citation Download Citation

Shigeyuki Kimura, Yuzaburo Segawa, Nobuhiro Kodama, Kenji Kitamura, Kosuke Kosuda, and Masayuki Tsutsumi "FZ growth of Ti3+:Al2O3 and its properties", Proc. SPIE 0736, New Slab and Solid-State Laser Technologies and Applications, (6 April 1987); https://doi.org/10.1117/12.938062

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