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26 May 2009 Numerical tool for analyzing light propagation in photonic-crystal waveguides in the presence of fabrication imperfections
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Proceedings Volume 7366, Photonic Materials, Devices, and Applications III; 736611 (2009) https://doi.org/10.1117/12.821997
Event: SPIE Europe Microtechnologies for the New Millennium, 2009, Dresden, Germany
Abstract
As they are compatible with on-chip integration, photonic-crystal (PhC) devices operating with slow light represent a promising solution for time-domain processing of optical signals. However, the slow-light transport is strongly impacted by random fabrication fluctuations, such as variations in hole sizes, shapes or locations, and since disorder is regarded as critical in practice, there has been significant effort to determine the induced extrinsic losses. Our current understanding of how does light actually propagate in real photonic-crystal waveguides (PhCWs) relies on perturbation approaches. Although intuitively sound, the latter are only valid in the weak-scattering regime, where the structural imperfections hardly affect the light propagation. Here we introduce a new Bloch mode scattering formalism that overcomes the present limitations of perturbation approaches, since it takes into account the inevitable multiple-scattering that leads to Anderson's localization in such waveguides.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Mazoyer, J. P. Hugonin, and P. Lalanne "Numerical tool for analyzing light propagation in photonic-crystal waveguides in the presence of fabrication imperfections", Proc. SPIE 7366, Photonic Materials, Devices, and Applications III, 736611 (26 May 2009); https://doi.org/10.1117/12.821997
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