Paper
20 May 2009 Large-area terahertz emitters based on GaInAsN
F. Peter, S. Winnerl, H. Schneider, M. Helm, K. Köhler
Author Affiliations +
Proceedings Volume 7366, Photonic Materials, Devices, and Applications III; 73661R (2009) https://doi.org/10.1117/12.821483
Event: SPIE Europe Microtechnologies for the New Millennium, 2009, Dresden, Germany
Abstract
We present large-area emitters based on GaInAsN which show efficient THz emission for excitation wavelengths up to 1.35 μm. The substrate material consists of a 1000 nm Ga1-yInyAs1-xNx (y = 0.11 and x = 0.04) layer grown by molecularbeam epitaxy on semi-insulating GaAs. On top there is an additional GaAs/Al0.3Ga0.7As heterostructure with thicknesses of 5 nm for the GaAs and 60 nm for the AlGaAs layer, respectively. Transmission measurements with a Fourier transform spectrometer reveal a bandgap corresponding to a wavelength of 1.5 μm. The resistance of a complete device with an active area of 1 mm2 is 0.3 MΩThis allows operation with high bias fields (30 kV/cm) without being limited by heating.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
F. Peter, S. Winnerl, H. Schneider, M. Helm, and K. Köhler "Large-area terahertz emitters based on GaInAsN", Proc. SPIE 7366, Photonic Materials, Devices, and Applications III, 73661R (20 May 2009); https://doi.org/10.1117/12.821483
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Terahertz radiation

Gallium arsenide

Electrodes

Optical parametric oscillators

Absorption

Electro optics

Crystals

Back to Top