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11 May 2009 European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force
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Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 73790W (2009) https://doi.org/10.1117/12.824273
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan
Abstract
The cost of production of a photomask set has been soaring over the last few years, and now reaches $1 million to $2 million, almost 10% of the overall cost of a new project development. And new projects have seen their profitability lifetime reduced over time to 3 to 6 months. Any uncontrolled increase in cost or delay can make the difference between a profitable or non profitable project, and can even lead to the cancellation of the entire project. For the last few years, silicon manufacturability issues have been taken into account in the design process through a widespread use of Design For Manufacturing tools, but so far the impact of design on mask manufacturability has not been thoroughly studied. This article presents a novel Design For Mask Manufacturing approach, which defines a robust process encompassing design rules and constraints, validation procedures, exchange mechanisms between all actors in the flow (designers, mask shops, and foundry) in order to minimize the number and impact of mask design issues, to trace their root causes and severity, and automation of the handoff of design and administrative data to the mask shop. A demonstrator for the DFMM flow is being shown.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eric Beisser, Michel Tissier, David Au, Stéphane Bonniol, Patrick Garcia, Philippe Morey-Chaisemartin, Dominique Sadran, Isabelle Servin, and Michel Tabusse "European MEDEA+ CRYSTAL project: DFM photomasks inputs for EDA workflow task force", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 73790W (11 May 2009); https://doi.org/10.1117/12.824273
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