A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer

Songbae Moon; Seong-Yoon Kim; Gyung-Yoon Bang; Byung-Gook Kim; Sang-Gyun Woo; Han-ku Cho

doi:10.1117/12.824315

11 May 2009 A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer

Songbae Moon, Seong-Yoon Kim, Gyung-Yoon Bang, Byung-Gook Kim, Sang-Gyun Woo, Han-ku Cho

Author Affiliations +

Proceedings Volume 7379, Photomask and Next-Generation Lithography Mask Technology XVI; 737913 (2009) https://doi.org/10.1117/12.824315
Event: Photomask and NGL Mask Technology XVI, 2009, Yokohama, Japan

Abstract

The information of the chromium top layer is important in photomask fabrication. Resist coating process and optical transmittance change of chromium after mask cleaning process depend on the surface morphology and thickness. In this paper, we present that ellipsometry, the nondestructive optical measurement method, is an effective and convenient method for the inspection of chromium oxide on the quartz blank. We checked data obtained by ellipsometry for chromium surface morphology with atomic force microscope, for surface energy with contact angle measurement, and for optical density change with optical transmittance measurement. It turns out that ellipsometry gives successfully the information of chromium oxide on the quartz blank.

Citation Download Citation

Songbae Moon, Seong-Yoon Kim, Gyung-Yoon Bang, Byung-Gook Kim, Sang-Gyun Woo, and Han-ku Cho "A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737913 (11 May 2009); https://doi.org/10.1117/12.824315

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