Paper
11 May 2009 Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects
Kyoji Yamashita, Nobuyuki Harabe, Masatoshi Hirono, Yukio Tamura, Ikunao Isomura, Yoshitake Tsuji, Eiji Matsumoto
Author Affiliations +
Abstract
This paper describes a novel technology Variable Sensitivity Detection (VSD) for de-sensing SRAF nuisance defects in a mask inspection system. The point of our approach is to search the nearest thin-line to each defect candidate and estimate the line-width with transmitted and reflected images. The dependence of transmitted and reflected image contract on line-width is calculated with a rigorous model. This technology de-senses lineend shortening and edge roughness of SRAF patterns without compromising sensitivity to main features. Total counts of SRAF nuisance detection were drastically reduced. The VSD technology was implemented to a platform of Nuflare NPI-5000PLUS.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyoji Yamashita, Nobuyuki Harabe, Masatoshi Hirono, Yukio Tamura, Ikunao Isomura, Yoshitake Tsuji, and Eiji Matsumoto "Variable sensitivity detection (VSD) technology for screening SRAF nuisance defects", Proc. SPIE 7379, Photomask and Next-Generation Lithography Mask Technology XVI, 737929 (11 May 2009); https://doi.org/10.1117/12.824323
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Cited by 1 scholarly publication.
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KEYWORDS
SRAF

Inspection

Photomasks

Opacity

Defect detection

Lithography

Defect inspection

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