Nanoimprint lithography for complex 3D micro-nano structures replication under low temperature

Hongwen Sun; Jingquan Liu; Di Chen

doi:10.1117/12.820583

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20 August 2009 Nanoimprint lithography for complex 3D micro-nano structures replication under low temperature

Hongwen Sun, Jingquan Liu, Di Chen

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Proceedings Volume 7402, Nanoengineering: Fabrication, Properties, Optics, and Devices VI; 74020U (2009) https://doi.org/10.1117/12.820583
Event: SPIE NanoScience + Engineering, 2009, San Diego, California, United States

Abstract

Focused Ion Beam (FIB) was employed to fabricate nanoimprint stamps. Complex three dimensional (3D) micro-nano patterns were fabricated including the emblems of Beijing 2008 Olympic Games and Shanghai 2010 World Expo on a single stamp. These micro/nano structures were then faithfully replicated to SU-8 2000.1 resist, with low imprint temperature. Field emission-scanning electron microscope (FE-SEM) and atomic force microscopy (AFM) were used to characterize both stamp and replica's surface profile and replication fidelity. The results show that nanoimprint with the FIB fabricated stamps can successfully replicate complex 3D micro-nano SU-8 structures at the same time under low temperature.

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Hongwen Sun, Jingquan Liu, and Di Chen "Nanoimprint lithography for complex 3D micro-nano structures replication under low temperature", Proc. SPIE 7402, Nanoengineering: Fabrication, Properties, Optics, and Devices VI, 74020U (20 August 2009); https://doi.org/10.1117/12.820583

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