Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine

Rens Henselmans; Lennino Cacace; Geerten Kramer; Nick Rosielle; Maarten Steinbuch

doi:10.1117/12.826067

21 August 2009 Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine

Rens Henselmans, Lennino Cacace, Geerten Kramer, Nick Rosielle, Maarten Steinbuch

Proceedings Volume 7426, Optical Manufacturing and Testing VIII; 742606 (2009) https://doi.org/10.1117/12.826067
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

Applying aspherical and freeform optics in high-end optical systems can improve system performance while decreasing the system mass, size and number of required components. The NANOMEFOS measurement machine is capable of universal non-contact and fast measurement of aspherical and freeform optics up to ∅500 mm, with an uncertainty of 30 nm (2σ). In this machine, the surface is placed on a continuously rotating air bearing spindle, while a specially developed optical probe is positioned over it by a motion system. A separate metrology system measures the probe and product position relative to a metrology frame. The prototype realization, including custom electronics and software, has been completed. The noise level at standstill is 0.88 nm rms. A reference flat was measured with 13 μm and 0.73 mm tilt. Both measurements show an rms flatness of about 8 nm rms, which correspond to the NMi measurement. A hemisphere has also been measured up to 50° slope, and placed 0.2 mm eccentric on the spindle. These measurements reproduce to about 5 nm rms. Calibration and software are currently being improved and the machine is applied in TNO aspherical and freeform optics production.

Citation Download Citation

Rens Henselmans, Lennino Cacace, Geerten Kramer, Nick Rosielle, and Maarten Steinbuch "Nanometer level freeform surface measurements with the NANOMEFOS non-contact measurement machine", Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 742606 (21 August 2009); https://doi.org/10.1117/12.826067

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available