Fabrication of 300-mm silicon reference wafer by using direct laser writer

Hyug-Gyo Rhee; Dong-Ik Kim; Seung-Ki Hong; Jae-Bong Song; Yun-Woo Lee

doi:10.1117/12.824846

21 August 2009 Fabrication of 300-mm silicon reference wafer by using direct laser writer

Hyug-Gyo Rhee, Dong-Ik Kim, Seung-Ki Hong, Jae-Bong Song, Yun-Woo Lee

Proceedings Volume 7426, Optical Manufacturing and Testing VIII; 742612 (2009) https://doi.org/10.1117/12.824846
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

We propose a new method based on direct laser writing to fabricate reference chromium patterns on a silicon wafer. Our method is able to fabricate a maximum 360-mm-diameter pattern with 651-nm position uncertainty. The minimum pattern size is about 0.8 μm (line width value) and the maximum available height of the pattern is slightly over 400 nm.

Citation Download Citation

Hyug-Gyo Rhee, Dong-Ik Kim, Seung-Ki Hong, Jae-Bong Song, and Yun-Woo Lee "Fabrication of 300-mm silicon reference wafer by using direct laser writer", Proc. SPIE 7426, Optical Manufacturing and Testing VIII, 742612 (21 August 2009); https://doi.org/10.1117/12.824846

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