Multilayer optics for femtosecond-diffractometry

J. Wiesmann; F. Hertlein; C. Michaelsen

doi:10.1117/12.824860

8 September 2009 Multilayer optics for femtosecond-diffractometry

J. Wiesmann, F. Hertlein, C. Michaelsen

Proceedings Volume 7448, Advances in X-Ray/EUV Optics and Components IV; 74480M (2009) https://doi.org/10.1117/12.824860
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

X-ray sources according to the principle of the "free electron laser" (FEL), will in future, be able to provide bright radiation with pulses in the femtosecond range. Even nowadays, home-lab X-ray sources with very short pulses in the sub-picosecond range are already available for lab experiments. These laser-based sources need different kinds of optics to direct the emitted X-rays onto the samples. On the one hand, the optics should transfer as much flux as possible and on the other hand, the brilliance and timestructure of the source should not be reduced too much. These requirements are fulfilled with 2-dimensional beam shaping multilayer optics. Their design, production and their influence on the shape of the X-ray beam will be explained in this contribution. The optics consist of bent substrates with shape tolerances below 100 nm, upon which multilayers are deposited with single layer thicknesses in the nanometer range and up to several hundreds of pairs of layers. Furthermore, these multilayers were designed with lateral thickness gradients within ± 1% deviation of the ideal shape. This means that a deposition precision in the picometer range is required. We use magnetron sputtering methods for deposition, optical profilometry in order to characterize the shape of the optics and X-ray reflectometry to characterize the multilayers.

Citation Download Citation

J. Wiesmann, F. Hertlein, and C. Michaelsen "Multilayer optics for femtosecond-diffractometry", Proc. SPIE 7448, Advances in X-Ray/EUV Optics and Components IV, 74480M (8 September 2009); https://doi.org/10.1117/12.824860

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KEYWORDS

X-ray optics

X-rays

Multilayers

Capillaries

Optics manufacturing

X-ray sources

Beam shaping

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