Resolution capability of EBM-6000 and EBM-7000 for nano-imprint template

S. Yoshitake; T. Kamikubo

doi:10.1117/12.835179

27 May 2009 Resolution capability of EBM-6000 and EBM-7000 for nano-imprint template

S. Yoshitake, T. Kamikubo

Proceedings Volume 7470, 25th European Mask and Lithography Conference; 74700H (2009) https://doi.org/10.1117/12.835179
Event: 25th European Mask and Lithography Conference, 2009, Dresden, Germany

Abstract

Nano-Imprint Lithography (NIL) is one of the leading potential solutions for next generation lithography. Obtaining full field template with fine pattern resolution and reasonable throughput are the critical challenges in NIL. In a previous study, we reported the pattern resolution capability of EBM-6000 under nominal operation conditions (Current density: 70 A/cm²) that can be applied to CMOS device fabrication of 45 nm hp generation1. Smaller blur for better resolution is necessary to make NIL templates for 32nm hp generation and beyond. Blur in patterning process can be suppressed with smaller process blur, smaller aberration of electron optics, smaller forward scattering in resist and coulomb interaction among electrons. Beam blur incurred by coulomb interaction among electrons in EBM-6000 can be reduced with lower current density. In this paper, resolution extendibility of EBM-6000 with lower current density (30 A/cm²) was tested as one of the resolution enhancement techniques. Smaller aberration of electron optics is also effective to improve the resolution. We also checked the resolution of EBM-7000 under nominal operation conditions (Current density: 200 A/cm²) for a basic study of this paper. EBM-7000, which was developed for mask fabrication of 32 nm hp generation and mask development of 22 nm hp generation, will keep using 50 kV acceleration voltage and enhanced electron optics with smaller aberration as compared with EBM-6000².

Citation Download Citation

S. Yoshitake and T. Kamikubo "Resolution capability of EBM-6000 and EBM-7000 for nano-imprint template", Proc. SPIE 7470, 25th European Mask and Lithography Conference, 74700H (27 May 2009); https://doi.org/10.1117/12.835179

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available