Translator Disclaimer
23 September 2009 Printability verification function of mask inspection system
Author Affiliations +
In addition to the conventional demands for high sensitivities with which the mask inspection system detects the minute size defects, capability to extract true defects from a wide variety of patterns that should not be counted as pseudo defects has been quite demanding. It is necessary to ascertain suppression of MEEF incurred by the combination of parameters such as LER and defects of SRAF. NFT and Brion are jointly developing a mask-image based printability verification system with functions combining their respective technologies with the results from ASET's research. This report describes such defect detection results and introduces the development of a mask inspection system with printability verification function.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hideo Tsuchiya, Masaki Yamabe, Masakazu Tokita, Kenichi Takahara, Kinya Usuda, Fumio Ozaki, and Nobutaka Kikuiri "Printability verification function of mask inspection system", Proc. SPIE 7488, Photomask Technology 2009, 74880B (23 September 2009);

Back to Top