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23 September 2009 A universal mask management relational database
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With the emergence of submicron technologies new product development costs have soared to reach an average of $15M. This includes all direct and indirect costs from specification to the start of volume production. At 65nm a single mask set costs more than $1M. As statistically final silicon needs at least one rework on metal layers, we can roughly estimate that mask budget is at least 10% of the chip development. It is then obvious that IDM companies as well as fabless design centers must take special care for mask management. Improving data exchange between mask data preparation teams and mask shops by using the SEMI-P10 standard has been a great step, but building an internal mask data preparation database to warrant a safe traceability of all masks still remains a challenge. This paper describes a relational database, which manages all the data related to mask data preparation during the entire life of the project. This database is not only dedicated to mask ordering, it also includes feedbacks on mask manufacturing from the mask shop and on silicon manufacturing from the production line making mask traceability possible.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philippe Morey-Chaisemartin "A universal mask management relational database", Proc. SPIE 7488, Photomask Technology 2009, 748822 (23 September 2009);

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