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23 September 2009 Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks
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With each new process technology node, chip designs increase in complexity and size, leading to a steady increase in data volumes. As a result, mask data prep flows require more computing resources to maintain the desired turn-around time (TAT) at a low cost. The effect is aggravated by the fact that a mask house operates a variety of equipment for mask writing, inspection and metrology - all of which, until now, require specific data formatting. An industry initiative sponsored by SEMI® has established new public formats - OASIS® (P39) for general layouts and OASIS.MASK (P44) for mask manufacturing equipment - that allow for the smallest possible representation of data for various applications. This paper will review a mask data preparation process for mask inspection based on the OASIS formats that also reads OASIS.MASK files directly in real time into the inspection tool. An implementation based on standard parallelized computer hardware will be described and characterized as demonstrating throughputs required for the 45nm and 32nm technology nodes. An inspection test case will also be reviewed.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Suheil Zaatri, Yan Liu, Michael Asturias, Joan McCall, Wei-Guo J. Lei, Tsafi Lapidot, Khen Ofek, Aviram Tam, Mark Wagner, Amanda Bowhill, Emile Sahouria, Minyoung Park, Neil DeBella, Pradiptya Ghosh, and Steffen Schulze "Deployment of OASIS.MASK (P44) as direct input for mask inspection of advanced photomasks", Proc. SPIE 7488, Photomask Technology 2009, 748823 (23 September 2009);

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