Impact of mask roughness on wafer line-edge roughness

Chris A. Mack

doi:10.1117/12.834787

23 September 2009 Impact of mask roughness on wafer line-edge roughness

Chris A. Mack

Proceedings Volume 7488, Photomask Technology 2009; 748828 (2009) https://doi.org/10.1117/12.834787
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

The influence of line-edge roughness (LER) of an optical photomask on the resulting printed wafer LER is investigated. The LER Transfer function (LTF) proposed by Naulleau and Gallatin, and later corrected by Tanabe, is shown to be a very useful tool for evaluating the low-pass filtering behavior of the imaging tool and its impact on the transfer of mask LER to the wafer. Highfrequency mask LER can also impact wafer LER by lowering the normalized image log-slope (NILS) of the image, though it would take a large amount of mask LER before this affect would be noticeable. Low-frequency mask LER, most likely due to mask writer errors such as shot placement or rotation errors, will produce wafer LER that may be significant in magnitude. Further work characterizing the magnitude and frequency content of mask LER over many different masks and processes is needed.

Citation Download Citation

Chris A. Mack "Impact of mask roughness on wafer line-edge roughness", Proc. SPIE 7488, Photomask Technology 2009, 748828 (23 September 2009); https://doi.org/10.1117/12.834787

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available