Paper
30 September 2009 Parallel processing for pitch splitting decomposition
Levi Barnes, Yong Li, David Wadkins, Steve Biederman, Alex Miloslavsky, Chris Cork
Author Affiliations +
Abstract
Decomposition of an input pattern in preparation for a double patterning process is an inherently global problem in which the influence of a local decomposition decision can be felt across an entire pattern. In spite of this, a large portion of the work can be massively distributed. Here, we discuss the advantages of geometric distribution for polygon operations with limited range of influence. Further, we have found that even the naturally global "coloring" step can, in large part, be handled in a geometrically local manner. In some practical cases, up to 70% of the work can be distributed geometrically. We also describe the methods for partitioning the problem into local pieces and present scaling data up to 100 CPUs. These techniques reduce DPT decomposition runtime by orders of magnitude.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Levi Barnes, Yong Li, David Wadkins, Steve Biederman, Alex Miloslavsky, and Chris Cork "Parallel processing for pitch splitting decomposition", Proc. SPIE 7488, Photomask Technology 2009, 74882L (30 September 2009); https://doi.org/10.1117/12.831396
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Cited by 1 scholarly publication.
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KEYWORDS
Double patterning technology

Parallel processing

Photomasks

Etching

Lithography

Neodymium

Optical lithography

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