The application of new simulated annealing genetic algorithm in film characters measurement

Dong Chu; Xing-zhi Gong; Liang Cheng; Fei-hong Yu

doi:10.1117/12.837924

20 November 2009 The application of new simulated annealing genetic algorithm in film characters measurement

Dong Chu, Xing-zhi Gong, Liang Cheng, Fei-hong Yu

Author Affiliations +

Proceedings Volume 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems; 75111K (2009) https://doi.org/10.1117/12.837924
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

A new global optimization method for thin film thickness calculation is presented in this paper. A new adaptive simulated annealing (ASA) combining with genetic algorithm is brought out. Adding traditional genetic algorithm to simulated annealing process avoids the premature convergence problem and improves the ability of global searching effectively. Firstly it generates a new group of local optimums through genetic and mutation operation; then the solutions are accepted at a certain probability, and will be calculated respectively in ASA process as the initial solutions. At last conjugate gradient algorithm is utilized to search accurately and quickly. This new ASGA can effectively enhance the robustness of the algorithm and reduce the limitation of the searching area. The experimental results show that the proposed algorithm can calculate the thickness of single layer and 2-layer thin film within the range of 10nm to 1μ m and less than 4% calculation error.

Citation Download Citation

Dong Chu, Xing-zhi Gong, Liang Cheng, and Fei-hong Yu "The application of new simulated annealing genetic algorithm in film characters measurement", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75111K (20 November 2009); https://doi.org/10.1117/12.837924

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