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26 October 2009 Periodical polymer grating structure with high aspect ratio
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A new procedure for fabricating a periodic structure on a UV polymer at submicron range using holographic interferometry and molding processes is described. First, holographic interference using a He-Cd (325 nm) laser was used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 200 nm nickel thin film was then sputtered onto the positive photoresist. Final line pattern on a UV polymer was formed from casting against the master mold. Initial results show the technique can accurately control the grating's period and depth. A high aspect ratio of grating period (gp) to depth (d) is about 1.35.
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Jau-Kun Kuo, Wen-Chung Chang, Kao-Feng Yarn, and Wei-Ching Chuang "Periodical polymer grating structure with high aspect ratio", Proc. SPIE 7516, Photonics and Optoelectronics Meetings (POEM) 2009: Optoelectronic Devices and Integration, 75160J (26 October 2009);

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