Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system

Richard Tu; Thomas Sebald

doi:10.1117/12.837039

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11 December 2009 Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system

Richard Tu, Thomas Sebald

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Proceedings Volume 7520, Lithography Asia 2009; 752015 (2009) https://doi.org/10.1117/12.837039
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

E-Reticle^™ system is an electrostatic field test device, which has the form factor of a conventional six inch quartz production reticle. The E-Reticle was used to assess the ESD damage risks in a mask cleaning tool. Test results indicate that a reticle may see higher than ITRS recommended electrostatic potential specifications when mechanical operations and cold DIW rinse start and in progress, hence seeing increased probability of electrostatic induced damages.

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Richard Tu and Thomas Sebald "Analyzing electrostatic induced damage risk to reticles with an in situ e-reticle system", Proc. SPIE 7520, Lithography Asia 2009, 752015 (11 December 2009); https://doi.org/10.1117/12.837039

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