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11 December 2009 Back side photomask haze revisited
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Proceedings Volume 7520, Lithography Asia 2009; 752018 (2009)
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan
Back (glass) side haze on photomasks has been previously reported and continues to present problems in many fabs throughout the industry. While some process changes have resulted in the reduction in both the occurrences and rate at which back side haze forms; proper handling and storage of reticles remains paramount in protecting all surfaces on the reticle from haze formation. We will describe again the basic mechanisms for haze formation and how proper storage can result in significantly reducing the risk of haze formation during storage and use in the fab.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian J. Grenon and Oleg Kishkovich "Back side photomask haze revisited", Proc. SPIE 7520, Lithography Asia 2009, 752018 (11 December 2009);

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