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11 December 2009Back side photomask haze revisited
Back (glass) side haze on photomasks has been previously reported and continues to
present problems in many fabs throughout the industry. While some process changes
have resulted in the reduction in both the occurrences and rate at which back side haze
forms; proper handling and storage of reticles remains paramount in protecting all
surfaces on the reticle from haze formation. We will describe again the basic mechanisms
for haze formation and how proper storage can result in significantly reducing the risk of
haze formation during storage and use in the fab.
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Brian J. Grenon, Oleg Kishkovich, "Back side photomask haze revisited," Proc. SPIE 7520, Lithography Asia 2009, 752018 (11 December 2009); https://doi.org/10.1117/12.840273