Generation and characterization of spatially distributed laser produced plasma extreme ultraviolet source

Kuang-Po Chang; Oran Morris; Fergal O'Reilly; Padraig Dunne; Gerard O'Sullivan

doi:10.1117/12.839648

14 December 2009 Generation and characterization of spatially distributed laser produced plasma extreme ultraviolet source

Kuang-Po Chang, Oran Morris, Fergal O'Reilly, Padraig Dunne, Gerard O'Sullivan

Author Affiliations +

Proceedings Volume 7520, Lithography Asia 2009; 75202P (2009) https://doi.org/10.1117/12.839648
Event: SPIE Lithography Asia, 2009, Taipei, Taiwan

Abstract

Two and three dot laser produced plasma extreme ultraviolet sources have been generated using a Fourier diffractive optical element (DOE). The DOE featured a >90% diffraction efficiency and a power handling capability of >100 MW. The plasmas were formed on a planar bulk tin target by pulses from a Nd:YAG laser delivering up to 360 mJ per pulse in a time of 15 ns (full-width half-maximum intensity) at the fundamental wavelength of 1064 nm. After passing through the DOE, the laser beam was focused onto the target by a pair of lens. The resulting spot radius was estimated to be 8.2±0.2 μm 1/e² on the target. The extreme ultraviolet radiation emitted by the plasma was imaged using a 122 μm imaging slit in conjunction with the 38 μm slit of the spectrometer. The one dimensional image of the laser produced plasma extreme ultraviolet source, together with its spectrum, was recorded by an absolutely calibrated Jenoptic 0.25 m EUV spectrograph. The spectrograph was located at an observation angle of 45 degrees with respect to the target. The vacuum chamber and spectrograph were both maintained at a base pressure of 10^-6 Torr. The recorded 1D spatial distribution and EUV spectra demonstrate the feasibility of EUV patterning by the novel optical method. The characteristics and potential applications of this method are investigated in this paper.

Citation Download Citation

Kuang-Po Chang, Oran Morris, Fergal O'Reilly, Padraig Dunne, and Gerard O'Sullivan "Generation and characterization of spatially distributed laser produced plasma extreme ultraviolet source", Proc. SPIE 7520, Lithography Asia 2009, 75202P (14 December 2009); https://doi.org/10.1117/12.839648

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Plasma

Extreme ultraviolet

Tin

Diffractive optical elements

EUV optics

Spectrographs

Absorption

Show All Keywords

Keywords/Phrases

Search In:

Publication Years