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25 January 2010Enhanced sensitivity achievement using advanced device simulation of multifinger photo gate active pixel sensors
A 2-dimensional device simulation of Multi finger active pixel sensors is investigated for obtaining enhanced pixel
sensitivity. Photo gate APS use a MOS capacitor that can capture incident illumination with a potential well created
under the photo gate. The major drawback of such a technology is the absorption of shorter wavelength by the
polysilicon gate resulting in a higher sensitivity in the red visible spectrum than in the blue range. In our previous work
we implemented 0.18μm CMOS standard and multi fingered photo gate design where the enclosed detection area is
divided by 3, 5 and 7 fingers. The experimental results showed that fringing field created potential wells for the 3 and 5
finger photo gate designs have 1.7 times higher collection of photo carriers over the standard photo gate. The device
simulation showed that fringing fields from the edges of the poly gates created potential wells that fully covered the open
silicon areas allowing light conversion without the optical absorption in the poly silicon gates. Extending simulations to
0.5 μm, 0.25 μm and 0.18 μm multifinger poly gates showed that the fringing fields stayed the same width as the gates
shrunk, so that as the number of fingers increased the potential well in the open areas became more uniform. The device
sensitivity based on the potential well locations, and previous experimental results, suggested peak efficiencies for the
0.5 μm design as 7 fingers, 0.25 μm at 9 fingers and 0.18 μm at 11 fingers. Peak efficiency was projected to be 2.2 times
that of a standard photogate.
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Phanindra V. R. H. Kalyanam, Glenn H. Chapman, Ash M. Parameswaran, "Enhanced sensitivity achievement using advanced device simulation of multifinger photo gate active pixel sensors," Proc. SPIE 7536, Sensors, Cameras, and Systems for Industrial/Scientific Applications XI, 75360G (25 January 2010); https://doi.org/10.1117/12.839157