Two-photon lithography and nanoprocessing with picojoule extreme ultrashort 12 femtosecond laser pulses

Karsten König; Aisada Uchugonova; Michael Schug; Huijing Zhang; Sumarie Saremi; Dara Feili; Helmut Seidel

doi:10.1117/12.841993

17 February 2010 Two-photon lithography and nanoprocessing with picojoule extreme ultrashort 12 femtosecond laser pulses

Karsten König, Aisada Uchugonova, Michael Schug, Huijing Zhang, Sumarie Saremi, Dara Feili, Helmut Seidel

Author Affiliations +

Proceedings Volume 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV; 75840K (2010) https://doi.org/10.1117/12.841993
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

A compact ultra-broadband femtosecond laser scanning microscope with 12 femtoseconds pulse width at the focal plane of a high NA objective has been employed in material nanoprocessing. The laser works at 85 MHz with an M-shaped emission spectrum with maxima at 770 nm and 827 nm. Different motorized setups based on the introduction of chirped mirrors, flint glass wedges, and glass blocks have been realized to vary the in situ pulse length from 12 femtoseconds up to 3 picoseconds. Nanoprocessing was performed in silica, photoresists, glass, polymers, and biological structures. Mean powers as low as 2 mW were sufficient to realize plasma-mediated cutting effects in human chromosomes with sub-80 nm cut width. Using a mean power of 7-9 mW, transient nanoholes were "drilled" in the cellular membrane for targeted transfection of stem cells and the introduction of μRNA probes. Region of interest (ROI) scanning have been used for optical cleaning of human adult stem cell populations and blood cell suspensions. 3D two-photon nanolithography based on the ultrabroad band laser pulses was realized with the photoresist SU-8. Multiphoton sub-20fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets.

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Karsten König, Aisada Uchugonova, Michael Schug, Huijing Zhang, Sumarie Saremi, Dara Feili, and Helmut Seidel "Two-photon lithography and nanoprocessing with picojoule extreme ultrashort 12 femtosecond laser pulses", Proc. SPIE 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV, 75840K (17 February 2010); https://doi.org/10.1117/12.841993

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