Second harmonic optimization of a hologram

S. Hasegawa; Y. Hayasaki

doi:10.1117/12.841929

17 February 2010 Second harmonic optimization of a hologram

S. Hasegawa, Y. Hayasaki

Proceedings Volume 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV; 758414 (2010) https://doi.org/10.1117/12.841929
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

Precise control of diffraction peaks of a hologram is indispensable in holographic femtosecond laser processing. To obtain the uniform diffraction peaks, an adaptive optimization due to the diffraction peaks measured by an image sensor was proposed. It used a one-photon absorption. However, the structure processed by a femtosecond laser pulse was based on multi-photon absorptions. Therefore, a mismatch between the optimized diffraction peaks and the processed structures was observed. An adaptive optimization method using second harmonics induced by parallel pulse irradiations to a nonlinear optical crystal is proposed to solve this mismatch.

Citation Download Citation

S. Hasegawa and Y. Hayasaki "Second harmonic optimization of a hologram", Proc. SPIE 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV, 758414 (17 February 2010); https://doi.org/10.1117/12.841929

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