Structural and optical properties of TiO2 thin films annealed in O2 and N2 gases flow

Seon Hoon Kim; Tae Un Kim; Doo Gun Kim; Hyun Chul Ki; Geum-Yoon Oh; Hyo Jin Kim; Hang Ju Ko; Myung-Soo Han; Swook Hann; Hwe Jong Kim

doi:10.1117/12.841681

15 February 2010 Structural and optical properties of TiO₂ thin films annealed in O₂ and N₂ gases flow

Seon Hoon Kim, Tae Un Kim, Doo Gun Kim, Hyun Chul Ki, Geum-Yoon Oh, Hyo Jin Kim, Hang Ju Ko, Myung-Soo Han, Swook Hann, Hwe Jong Kim

Author Affiliations +

Proceedings Volume 7603, Oxide-based Materials and Devices; 76031U (2010) https://doi.org/10.1117/12.841681
Event: SPIE OPTO, 2010, San Francisco, California, United States

Abstract

Titanium dioxide (TiO₂) thin films were prepared by ion-assisted electron-beam deposition on glass at room temperature and were annealed by rapid thermal annealing in O₂ and N₂ gas flow. TiO₂ thin films annealed in N₂ gas flow are (110) rutile phase and (101) anatase phase, but in O₂ gas flow are (110) rutile phase. The optical band gaps of the TiO₂ thin films are increased to 3.281 eV with annealing treatment of 300 ~ 500 °C in O₂ gas flow and to 3.271 eV in N₂ gas flow. However, the band gap begins to decrease to 3.277 eV at the annealing temperature of 600 °C in O₂ gas flow and to 3.257 eV in N₂ gas flow, respectively.

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Seon Hoon Kim, Tae Un Kim, Doo Gun Kim, Hyun Chul Ki, Geum-Yoon Oh, Hyo Jin Kim, Hang Ju Ko, Myung-Soo Han, Swook Hann, and Hwe Jong Kim "Structural and optical properties of TiO₂ thin films annealed in O₂ and N₂ gases flow", Proc. SPIE 7603, Oxide-based Materials and Devices, 76031U (15 February 2010); https://doi.org/10.1117/12.841681

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