A novel fabrication process of polymeric photonic crystal

Seung Hun Oh; Chang Seok Kim; El-Hang Lee; Myung Yung Jeong

doi:10.1117/12.841669

15 February 2010 A novel fabrication process of polymeric photonic crystal

Seung Hun Oh, Chang Seok Kim, El-Hang Lee, Myung Yung Jeong

Proceedings Volume 7605, Optoelectronic Integrated Circuits XII; 76050S (2010) https://doi.org/10.1117/12.841669
Event: SPIE OPTO, 2010, San Francisco, California, United States

Abstract

Photonic crystals (PCs) are recently fabricated by the Nano Imprint Lithography (NIL) on the polymers with low indexes because of the simple and short process time and ease of precise manufacturing. But, PCs require high dimensional accuracy due to their optical characteristics. The dimensional accuracy of PCs using NIL depends on the stamp. NIL stamps are usually fabricated by EBL, lift off and etching process. The damage of PC structures happens during the lift off process due to the tearing and ripping problem. So, we report on novel fabrication of NIL stamp using PMGI/PMMA bi-layer lift off technique. We can control the extent of the undercut in the support layer through independent development of PMGI and PMMA. We simulate the band structure of a triangle lattice with a polymer refractive index of 1.495. From the simulation results, we derive that dimensional accuracy of PCs should be maintained below ±30 nm. We make the original pattern by EBL. An optimal dose for achieving this dimension on the PMMA is determined by experiment and has 110 μC/cm² at the aperture 10 μm and EHT 20 kV. To establish optimal process condition, development for PMMA and PMGI is performed according to development time. Then, we deposit the Ni layer using e-beam evaporator and perform the lift off process. We can obtain the PCs structure of Ni metal layer with 70 nm undercut at the optimal development condition. The fabricated PCs structure has dimensional accuracy below 5 nm. These values are sufficient for meeting with optical characteristics of PCs.

Citation Download Citation

Seung Hun Oh, Chang Seok Kim, El-Hang Lee, and Myung Yung Jeong "A novel fabrication process of polymeric photonic crystal", Proc. SPIE 7605, Optoelectronic Integrated Circuits XII, 76050S (15 February 2010); https://doi.org/10.1117/12.841669

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KEYWORDS

Polymers

Photonic crystals

Polymethylmethacrylate

Nanoimprint lithography

Silicon

Electron beam lithography

Etching

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