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22 January 2010Quantum dot photodetectors based on structures with collective potential barriers
It is known that major restrictions of room-temperature semiconductor photodetectors and some other optoelectronic
devices are caused by short photoelectron lifetime, which strongly reduces the photoresponse. Here we report our
research on advanced optoelectronic materials, which combine manageable photoelectron lifetime, high mobility, and
quantum tuning of localized and conducting states. These structures integrate quantum dot (QD) layers and correlated
QD clusters with quantum wells (QWs) and heterointerfaces. The integrated structures provide many possibilities for
engineering of electron states as well as specific kinetic and transport properties. Thus, these structures have the strong
potential to overcome the limitations of traditional QD and QW structures. The main distinctive characteristic of the QD
structures with collective potential barriers is an effective control of photoelectron capture due to separation of highly
mobile electrons transferring the photocurrent along heterointerfaces from the localized electron states in the QD blocks
(rows, planes, and various clusters). Besides manageable photoelectron kinetics, the advanced QD structures will also
provide high coupling to radiation, low generation-recombination noise, and high scalability.
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Li-Hsin Chien, A. Sergeev, V. Mitin, S. Oktyabrsky, "Quantum dot photodetectors based on structures with collective potential barriers," Proc. SPIE 7608, Quantum Sensing and Nanophotonic Devices VII, 760826 (22 January 2010); https://doi.org/10.1117/12.842239