Paper
2 December 2009 High-power ultra-short pulse UV laser system
Junewen Chen, Jung-Chao Chen, Shu-Yuan Lin, Chia-Hao Yeh, Chin-Yi Liu
Author Affiliations +
Proceedings Volume 7631, Optoelectronic Materials and Devices IV; 763114 (2009) https://doi.org/10.1117/12.851845
Event: Asia Communications and Photonics, 2009, Shanghai, Shanghai , China
Abstract
We have developed a terawatts high intensity, sub-hundred femtosecond ultra-short pulses, 248.6 nm ultraviolet laser systems, with dye seed laser in blue-green regime, amplified in the multi-stage dye amplifiers and then frequency doubled and finally amplified with multiple-passes KrF amplifier. We have characterized the system performances, the amplified interaction volume, the amplified spontaneous emission optimization, the Excimer amplifier and the system merits.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junewen Chen, Jung-Chao Chen, Shu-Yuan Lin, Chia-Hao Yeh, and Chin-Yi Liu "High-power ultra-short pulse UV laser system", Proc. SPIE 7631, Optoelectronic Materials and Devices IV, 763114 (2 December 2009); https://doi.org/10.1117/12.851845
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KEYWORDS
Amplifiers

Ultraviolet radiation

Laser systems engineering

Dye lasers

Pulsed laser operation

Mirrors

High power lasers

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