Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments

Masaki Yoshioka; Yusuke Teramoto; Peter Zink; Guido Schriever; Gota Niimi; Marc Corthout

doi:10.1117/12.846545

20 March 2010 Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments

Masaki Yoshioka, Yusuke Teramoto, Peter Zink, Guido Schriever, Gota Niimi, Marc Corthout

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763610 (2010) https://doi.org/10.1117/12.846545
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

For industrial EUV (extreme ultra-violet) lithography applications high power EUV light sources are needed at a central wavelength of 13.5 nm. Philips Extreme UV GmbH, EUVA and XTREME technologies GmbH have jointly developed tin DPP (Discharge Produced Plasma) source systems. This paper focuses in the first part on the results achieved from the Alpha EUV sources in the field. After integration of power upgrades in the past, now the focus is on reliability and uptime of the systems. The second part of this paper deals with the Beta SoCoMo that can be used in the first pre-production scanner tools of the lithography equipment makers. The performance will be shown in terms of power at Intermediate Focus, dose stability and product reliability but also its reachable collector lifetime, the dominant factor for Cost of Operation. In the third part of the paper the developments for the high volume manufacturing (HVM) phase are described. The basic engineering challenges in thermal scaling of the source and in debris mitigation can be proven to be solvable in practice based on the Beta implementation and related modeling calibrated with these designs. Further efficiency improvements required for the HVM phase will also be shown based on experiments. The further HVM roadmap can thus be realized as evolutionary steps from the Beta products.

Citation Download Citation

Masaki Yoshioka, Yusuke Teramoto, Peter Zink, Guido Schriever, Gota Niimi, and Marc Corthout "Tin DPP source collector module (SoCoMo): status of Beta products and HVM developments", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763610 (20 March 2010); https://doi.org/10.1117/12.846545

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