Normal incidence collector for LPP sources with integrated debris mitigation

Andrea Z. Giovannini; Franz Dieterich; Ian Henderson; Ndaona Chokani; Reza S. Abhari

doi:10.1117/12.846548

20 March 2010 Normal incidence collector for LPP sources with integrated debris mitigation

Andrea Z. Giovannini, Franz Dieterich, Ian Henderson, Ndaona Chokani, Reza S. Abhari

Proceedings Volume 7636, Extreme Ultraviolet (EUV) Lithography; 763613 (2010) https://doi.org/10.1117/12.846548
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The leading candidate for the manufacture of next generation semi-conductor devices is extreme ultraviolet lithography, with laser-produced plasmas as a candidate 13.5nm light source. A primary challenge for continuous operation is elimination of the debris load on the collector, without compromising the radiation intensity at the intermediate focus. A novel combination of thermal management and debris mitigation is developed in order to reduce the deformation and degradation of collector optics. This patent-pending novel debris mitigation technique enables the continuous operation of the source. The paper shows atomic force microscope measurements of the collector surface deposition. The debris mitigation system run at 50% design operating condition gives 90% debris mitigation effectiveness. The average temperature of the cooled collector is 36.5°C at the design point, with a peak-to-peak difference of 0.8°C. The collector geometry, after being adapted to compensate the thermal deformation, yields a spot size of 30μm at IF. Computational simulations, using ETH's multi-scale computational tools, complement the presented experimental results.

Citation Download Citation

Andrea Z. Giovannini, Franz Dieterich, Ian Henderson, Ndaona Chokani, and Reza S. Abhari "Normal incidence collector for LPP sources with integrated debris mitigation", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 763613 (20 March 2010); https://doi.org/10.1117/12.846548

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available