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22 March 2010 Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)
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Abstract
This paper summarizes the investigation of the evaluation methods of EUV resist outgassing based on pressure-rise, gas chromatography mass spectrometry (GC-MS) and quadrupole mass spectrometry (QMS). We discuss the merit and demerit about these three methods and propose an optimal employment of each evaluation method. In addition, detail results of resist outgassing evaluated from GC-MS were reported.
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Hiroaki Oizumi, Kazuyuki Matsumaro, Julius Santillan, and Toshiro Itani "Evaluations of EUV resist outgassing by gas chromatography mass spectrometry (GC-MS)", Proc. SPIE 7636, Extreme Ultraviolet (EUV) Lithography, 76362W (22 March 2010); https://doi.org/10.1117/12.846269
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