Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system

Akio Yamada; Yoshihisa Oae; Tatsuro Okawa; Masahiro Takizawa; Masaki Yamabe

doi:10.1117/12.846464

10 March 2010 Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system

Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370C (2010) https://doi.org/10.1117/12.846464
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In the Mask D2I project at ASET, the authors evaluated an e-beam multi column cell exposure system with character projection to expose photomask patterns of hp65nm and hp45nm devices. They prepared more than 2,000 characters in a deflection area of a character projection mask extracted from the hp65nm pattern. The character projection in the multi column cell system could expose patterns equivalent to those by the conventional variable shaped beams. In a typical pattern layout of photomasks for hp45nm devices, the four column cell system required an exposure time of about 1/3 of the time required by a single column system. The character projection can reduce the exposure time corresponding to the reduction of shot counts.

Citation Download Citation

Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, and Masaki Yamabe "Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370C (10 March 2010); https://doi.org/10.1117/12.846464

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